65 nm meeting

→ Europe/Paris
Bat 20 - uElec (https://cern.zoom.us/j/69600555186?pwd=eVcxUTBnc2J0bWwyQ3RBM0ttZkN6Zz09)

Bat 20 - uElec

https://cern.zoom.us/j/69600555186?pwd=eVcxUTBnc2J0bWwyQ3RBM0ttZkN6Zz09
Cacher
  • Jean Soudier presentation : 
    • New architecture vs old architecture.
    • In new architecture : adding a block (saving priority) prior to data saving.
  • Frederic Morel (Moss):
    • Everything is ready !
    • Documentation of Moss is done by Xiao Chao and the general document is done at CERN (gitlab to be checked and added to the minutes of our meeting).
  • Szymon Bugiel (Most):
    • More or less same status as Most.
    • Discussion about the future of the chips. What to do? Tests, PCB ...
    • Any action from our side? Writing documentation.
    • Tests are a kind of "open part" right now.
  • CE 65 nm :
    • We need to decide of what we want our colleagues from Prague to do.
    • The same of what to propose to colleagues from Zürich.

 

  • Do we need a specific meetings? 
    • Zürich: Mostly participating to data analysis.
    • Prague: test our sensor in different conditions than ours.
    • Propose to our external-colleagues to reproduce measurements we have done and cross-check that we obtain the same results.
    • Need to have some clear measurements to propose.
    • Prepare a starter kit: documentation, test, ???
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